Kayaku Advanced Materials Ancillaries
Kayaku Advanced Materials offers a broad line of ancillary products for resist thinning, edge bead removal, development, rinse and removal of photoresists. These products work effectively with their PMGI, LOR, PMMA & copolymer, and SU-8 resists, as well as with many other commercially available photoresist products.
Adhesion Promoter / Release Layer
Micro Materials can offer the following Adhesion Promoter from our partners:
- OmniCoat
Photoresist Thinners
Micro Materials can offer the following Photoresist Thinners from our partners:
- A thinner - to dilute PMMA A resists
- C thinner - to dilute PMMA C resists
- CPG thinner - to dilute SU-8 TF 6000 resists
- EL thinner - to dilute copolymer resists
- G thinner - to dilute LOR and PMGI SFG resists
- SU-8 2000 thinner - to dilute SU-8 2000, SU-8 3000 & KMPR® 1000 resists.
- T thinner - to dilute PMGI SF resists
Edge Bead Remover
Micro Materials can offer the following Photoresist Thinners from our partners:
- EBR PG
Developers
Micro Materials can offer the following Developers from our partners:
- MIBK:IPA 1:1 - High speed PMMA & copolymer resist development
- MIBK:IPA 1:2 - PMMA & copolymer resist development
- MIBK:IPA 1:3 - High resolution PMMA & copolymer resist development
- PMGI 101 developer - PMGI resist development
- PN 1000 Developer - PermiNex® 1000 resist development
- SU-8 developer - SU-8, SU-8 2000, SU-8 3000 & SU-8 TF 6000 resist development
Removal
Micro Materials can offer the following Remover from our partners:
- Remover PG - To strip PMGI, LOR, PMMA, KMPR® 1000 & minimally cross-linked SU-8 resists