AZ Developers
Micro Materials offers AZ 326, AZ 726 and AZ 2026 MIF Developers from stock in Australia. However, other Developers can be made available from request.
AZ® 326, 726, 2026 and 2033 MIF Developers
The following Developers are Metal Ion Free (MIF) developers in ready-to-use solutions:
- AZ® 326 MIF is 2.38 % TMAH (TetraMethylAmmoniumHydroxide).
- AZ® 726 MIF is 2.38 % TMAH with surfactants added for fast and homogeneous substrate wetting.
- AZ® 2026 MIF is 2.38 % TMAH in H2O with surfactants added for fast and homogeneous substrate wetting, and further additives for removal of resist residuals occasionally remaining after development. These additives, however, slightly increase the dark erosion.
- AZ® 2033 MIF is 3.00 % TMAH in H2O with surfactants added for fast and homogeneous substrate wetting, and further additives for removal of resist residuals (residues in certain lacquer families), but at the cost of a higher dark removal. Compared to the AZ® 2026 MIF, the normality is not 0.26 but 0.33. Thus the development rate is higher with the AZ® 2033 MIF.
AZ® 351B, 400K and AZ MIC Developers
The following Developers are Metal Ion Containing (MIC) Developers that are typically supplied as a concentrate that have to be diluted before use:
- AZ® Developer MIC is optimised for minimum Al attack. It is typically applied 1 : 1 diluted in DI-water for high contrast, or undiluted for a high development rate. The dark erosion of AZ Developer is slightly higher as compared to other developers.
- AZ® 351B MIC is based on buffered NaOH and typically used in 1 : 4 dilution.
- AZ® 400K MIC is based on buffered KOH and typically used in 1 : 4 dilution.